JAEA
  • help
  • PC | SP
  • JP | EN
          
Refine your search：     
Report No.
 - 
Clear All
Search Results: Records 1-3 displayed on this page of 3
  • 1

Presentation/Publication Type

Initialising ...

Refine

Journal/Book Title

Initialising ...

Meeting title

Initialising ...

First Author

Initialising ...

Keyword

Initialising ...

Language

Initialising ...

Publication Year

Initialising ...

Held year of conference

Initialising ...

Save select records

JAEA Reports

Chemisorption of CH$$_{3}$$Cl on Si(001) surface under UHV condition

Imanaka, Soichi*; Okada, Michio*; Kasai, Toshio*; Teraoka, Yuden; Yoshigoe, Akitaka

JAERI-Tech 2003-066, 36 Pages, 2003/08

JAERI-Tech-2003-066.pdf:7.13MB

The reactions of organic molecules with a Si(001) surface play important roles in many applied fields such as LSI, molecular device, sensor, non-liner optical materials, catalysis, coating, preservation from decay, and so on. Especially, the dissociative adsorption of CH$$_{3}$$Cl is an important initial process in the production of diamond and silicon carbide thin films. However, it is required to control the orientation of CH$$_{3}$$Cl for the elucidation of the detailed mechanism of the dissociative adsorption. In the present experiments, we studied the dissociative adsorption of CH$$_{3}$$Cl on a clean Si(001) surface under ultra-high vacuum using Scanning Tunneling Microscopy (STM). We found, for the first time, that there are two reaction passes of CH$$_{3}$$Cl(g) to CH$$_{3}$$(a)+Cl(a) and CH$$_{3}$$Cl(g) to CH$$_{3}$$(a)+Cl(g) in the dissociative adsorption of CH$$_{3}$$Cl on the Si${001}$ surface.

Oral presentation

Study on adsorption reaction of CH$$_{3}$$Cl on Si(100)2$$times$$1 by means of SR-XPS

Tsukada, Chie; Yoshida, Hikaru; Okada, Michio*; Yoshigoe, Akitaka; Yaita, Tsuyoshi

no journal, , 

Cs in clay mineral will be easy to desorb as halide. We should investigate the desorption mechanism. The clay mineral is constructed mainly by oxide with Si and Al. Thus, Si substrate and CH$$^{3}$$Cl are selected as the reaction model materials. The final purpose is to reveal the reaction for CH$$^{3}$$Cl molecular beam on Cs/Si substrate by means of XPS with synchrotron radiation (SR-XPS). As the first step, the purpose in this study is to reveal the adsorption reaction for CH$$^{3}$$Cl molecular beam on Si(100)2$$times$$1 by means of SR-XPS. The CH$$^{3}$$Cl will adsorb at CH$$^{3}$$ and/or Cl group on the Si dimer atom, respectively.

Oral presentation

Study on adsorption reaction of CH$$_{3}$$Cl on Si(100)2$$times$$1 by means of SR-XPS

Tsukada, Chie; Yoshida, Hikaru; Okada, Michio*; Yoshigoe, Akitaka; Yaita, Tsuyoshi

no journal, , 

To achieve Cs decontamination in clay minerals by using CH$$_{3}$$Cl gas, we have investigated the adsorption reactions and adsorption states of CH$$_{3}$$Cl at Si surfaces. In this conference, we report that dissociative adsorption of CH$$_{3}$$Cl to form CH$$_{3}$$ and Cl was revealed from the high energy-resolutions photoemission spectra.

3 (Records 1-3 displayed on this page)
  • 1